# US 7,072,438 B2 · Reflection type mask

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- Number: US 7,072,438 B2
- Document ID: US7072438B2
- Status: Granted
- Kind: B2
- Application number: 10/736,693
- Filed: 2003-12-17
- Published: 2004-07-01
- Granted: 2006-07-04
- Earliest claimed: 1996-05-17
- Assignees: Canon Kabushiki Kaisha
- Inventors: Keiko Chiba; Masami Tsukamoto; Yutaka Watanabe; Shinichi Hara; Hiroshi Maehara
- Web page: https://patentgrep.com/patent/US7072438B2

## CPC

- G03F 1/62: Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
- B82Y 40/00: Manufacture or treatment of nanostructures
- G03F 1/24: Reflection masks; Preparation thereof
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES

## Abstract

A reflection type mask includes a substrate on which a multi-layered film for reflecting X-rays is provided, a mask pattern which is formed on the multi-layered film for absorbing the X-rays, and a cover for protecting the mask pattern. The cover is detachably attached to the substrate.

## Claims

### Claim 1

A reflection type mask comprising:
a mask body including (a) a substrate, (b) a multi-layered film which is formed on said substrate, for reflecting X-rays, (c) a pattern which is formed on said multi-layered film for absorbing the X-rays; and
a cover for protecting said pattern,
wherein said cover includes a vent hole having a lid openably closeable to said vent hole, and at least a part of said cover being arranged so as to be detachably attachable to said mask body.

### Claim 2 (depends on 1)

A reflection type mask according to claim 1, further comprising an alignment mark formed on said multi-layered film.

### Claim 3 (depends on 1)

A reflection type mask according to claim 1, further comprising an alignment mark, wherein said cover protects said alignment mark.

### Claim 4 (depends on 3)

A reflection type mask according to claim 3, wherein said alignment mark is formed on said multi-layered film.

### Claim 5 (depends on 1)

A reflection type mask according to claim 1, wherein said vent hole is formed on a side surface of said cover.

### Claim 6

An X-ray mask comprising:
a mask body including a pattern for absorbing X-rays; and
a cover for protecting the pattern, which includes a vent hole,
wherein the cover encloses a surface of the mask body, on which the pattern is provided, and another surface opposite to the surface of said mask body, and is arranged so as to be detachably attachable to said mask body.

### Claim 7 (depends on 6)

An X-ray mask according to claim 6, wherein said mask body includes a membrane on which the pattern is formed and a substrate for supporting the membrane.

### Claim 8 (depends on 6)

An X-ray mask according to claim 6, wherein said cover includes a lid capable of opening and closing the vent hole.

### Claim 9 (depends on 6)

An X-ray mask according to claim 6, wherein said X-ray mask is arranged so as to be loaded into a mask cassette in a state in which the cover is attached onto said mask body.