Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus
AssigneeEbara Corporation
InventorsToshifumi Kimba, Shunsuke Nakai
Life of this patent
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Abstract
A jet of water in a cylindrical form is supplied from a jet nozzle onto a measurement surface of a substrate to form a column of the water extending between the nozzle and the measurement surface. Light is emitted from an irradiation fiber and transmitted through the column of water to the measurement surface. The light reflected by the measurement surface is received by a light-receiving fiber through the column of water. A measurement calculation unit measures the thickness of a film formed on the substrate, based on the intensity of the reflected light.
Claims18
A method of measuring a thickness of a film on a substrate, said method comprising:
- supplying a jet of light-transmitting liquid through a nozzle towards the film;
- emitting light from at least one optical fiber arranged within the nozzle so that the light travels through the light-transmitting liquid towards the film and is reflected by a surface of the film, wherein a distal end of the nozzle is closer to the film than a distal end of the at least one optical fiber;
- receiving the light reflected from the film and passing through the light-transmitting liquid into the distal end of the at least one optical fiber arranged within the nozzle;
- and
- measuring the thickness of the film based on the light reflected by the film.
An apparatus for measuring a thickness of a film on a substrate, said apparatus comprising:
- a conduit for supplying a jet of light-transmitting liquid from a distal end thereof towards the film;
- and
- at least one optical fiber arranged within said conduit for emitting light towards the film through the light-transmitting liquid, and for receiving the light reflected from a surface of the film and passing through the light-transmitting liquid, wherein a distal end of said conduit is closer to the surface of the film than a distal end of said at least one optical fiber, and wherein said at least one optical fiber is connected to a component for measuring a thickness of the film based on the light reflected from the surface of the film.
An apparatus for treating a substrate having a film on a surface of the substrate, said apparatus comprising:
- a holder for holding the substrate;
- and
- a film thickness measurement device for measuring a thickness of the film formed on the substrate, said film thickness measurement device comprising:
- a conduit for supplying a jet of light-transmitting liquid from a distal end thereof towards the film;
- and
- at least one optical fiber arranged within said conduit for emitting light towards the film through the light-transmitting liquid, and for receiving the light reflected from a surface of the film and passing through the light-transmitting liquid, wherein a distal end of said conduit is closer to the surface of the film than a distal end of said at least one optical fiber, and wherein said at least one optical fiber is connected to a component for measuring a thickness of the film based on the light reflected from the surface of the film.
Dependencies are inferred from the claim text.