US 7,072,028 B2 · Method and apparatus for chemical monitoring

Abstract

The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presence of consumption. In some embodiments, advancing to a next step in forming structures on the workpiece depends on the pattern of consumption meeting a process criteria. In other embodiments, a processing time standard is established, based on analysis of the relevant patterns. Yet other embodiments relate to controlling work on a workpiece, based on analysis of the relevant patterns. The invention may be either a process or a device including logic and resources to carry out a process.

Claims44

Dependent claims

A method of monitoring chemical utilization within a process chamber, including:

monitoring gas in the process chamber with a spectrometer having a plasma generator that is gaseously coupled to the process chamber;
calibrating the monitoring by flowing a known quantity or concentration of a first chemical into the process chamber and observing an intensity of one or more spectral peaks of a second chemical, the spectral peaks corresponding to consumption of the first chemical;
and
introducing the first chemical and forming or patterning a layer on a workpiece, while observing a pattern over time of consumption of the first chemical based on the intensity of the spectral peaks.

1 more element

Dependencies are inferred from the claim text.

Method and apparatus for chemical monitoring

Life of this patent

Method and apparatus for chemical monitoring

Life of this patent

Abstract

Claims44