Exposure apparatus and optical component for the same
AssigneeNikon Corporation
InventorsMasafumi Mizuguchi, Norio Komine
Life of this patent
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Abstract
In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. The thickness of the synthetic silica glass component, and the energy density per pulse and the pulse width of the pulsed light satisfy the following expression: τI−2L−1.7≧0.02 (ns·mJ−2·cm2.3·pulse2) wherein L is the thickness (unit: cm) of the synthetic silica glass component, I is the energy density (unit: mJ·cm−2·pulse−1) per pulse, and τ is the pulse width (unit: ns).
Claims11
An exposure apparatus which comprises a light source emitting pulsed light having a wavelength of 300 nm or less and which exposes an exposure object to light by applying the pulsed light passed through a plurality of optical components,
- wherein at least one of the plurality of optical components is a synthetic silica glass component;
- and a thickness of the synthetic silica glass component, an energy density per pulse of pulsed light applied to the synthetic silica glass component, and a pulse width of the pulsed light satisfy the following expression (1):
- τI−2L−1.7≧0.002(ns·mJ−2·cm2.3·pulse2) (1)
- wherein L is the thickness (unit:
- cm) of the synthetic silica glass component, I is the energy density (unit:
- mJ·cm−2·pulse−1) per pulse of the pulsed light applied to the synthetic silica glass component, and τ is the pulse width (unit:
- ns) of the pulsed light.
A synthetic silica glass component for exposure apparatus used in an optical system of an exposure apparatus which exposes an exposure object to pulsed light having a wavelength of 300 nm or less,
- wherein a thickness of the synthetic silica glass component, an energy density per pulse of the pulsed light applied to the synthetic silica glass component, and a pulse width of the pulsed light satisfy the following expression (3):
- τI−2L−1.7≧0.02(ns·mJ−2·cm2.3·pulse2) (3)
- wherein L is the thickness (unit:
- cm) of the synthetic silica glass component, I is the energy density (unit:
- mJ·cm−2·pulse−1) per pulse of the pulsed light applied to the synthetic silica glass component, and τ is the pulse width (unit:
- ns) of the pulsed light.
Dependencies are inferred from the claim text.