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US 7,072,025 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsHenrikus Herman Marie Cox, Robertus Nicodemus Jacobus Van Ballegoij, Petrus Matthijs Henricus Vosters, Sven Antoin Johan Hol, Sebastiaan Maria Johannes Cornelissen
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Abstract
A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.
Claims24
A lithographic projection apparatus, comprising:
- a radiation system configured to provide a beam of radiation;
- a support configured to support a patterning device, the patterning device being configured to pattern the beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- a base frame;
- a balance mass;
- and
- an actuator configured to actuate a force between the substrate table or the support and the balance mass thereby to position the substrate table or the support, wherein the balance mass is coupled to the base frame via an elastic coupling so that the balance mass has a suspension eigenfrequency of between 0.3 and 10 Hz such that a portion of a reaction force is exerted on the base frame.
5 more elements
A device manufacturing method, comprising:
- patterning a beam of radiation with a patterning device supported on a support;
- projecting the patterned beam of radiation onto a target portion of a layer of radiation- sensitive material at least partially covering a substrate on a substrate table positioned on a base frame;
- actuating a force between the substrate table or the support and a balance mass thereby to position the substrate table or the support;
- and
- transmitting part of the force to the base frame through an elastic coupling which couples the balance mass to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.
2 more elements
Dependencies are inferred from the claim text.