Position detection apparatus having a plurality of detection sections, and exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorsHisaaki Oguri, Toyoshige Sasaki, Masanobu Hasegawa
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Abstract
A surface position detection apparatus of this invention includes a position detection section having a plurality of electrodes opposing the object surface to be measured, and a measurement device for selecting at least one electrode of the plurality of electrodes in accordance with the shape of the object surface, supplying an AC current to the selected electrode, and measuring the current flowing to the electrode, thereby measuring the distance between the electrode and object surface.
Claims15
An electrostatic sensing apparatus having an electrode for sensing a surface position of a shot region in a substrate to which a pattern is transferred by an exposure apparatus, said electrostatic sensing apparatus comprising:
- a plurality of the electrodes;
- and
- a system which selects at least one electrode from said plurality of electrodes, based on layout information of the shot region to be detected, and calculates the surface position based upon an output of said selected at least one electrode.
An exposure apparatus for transferring a pattern to a shot region in a substrate, said apparatus comprising:
- an electrostatic sensor, for sensing a surface position of the shot region, having a plurality of electrodes;
- and
- a system which selects at least one electrode from said plurality of electrodes, based on layout information of the shot region to be detected, and calculates the surface position based upon an output of said selected at least one electrode.
An exposure apparatus for transferring a pattern to a shot region in a substrate, said apparatus comprising:
- a plurality of electrostatic sensors, for sensing a surface position of the shot region, each having a plurality of electrodes;
- and
- a system which selects at least one electrode from said plurality of electrodes of said plurality of electrostatic sensors, based on layout information of the shot region to be detected, and calculates the surface position based upon an output of said selected at least one electrode.
A scanning exposure apparatus for transferring a pattern of a mask to a shot region in a substrated by scanning the mask and the substrate relative to a slit- shaped exposure beam, said apparatus comprising:
- an electrostatic sensor, for sensing a surface position of the shot region, having a plurality of electrodes arranged in a direction perpendicular to a scanning direction of the mask and the substrate;
- and
- a system which selects at least one electrode from said plurality of electrodes, based on layout information of the shot region to be detected, and calculates the surface position based upon an output of said selected at least one electrode.
A scanning exposure apparatus for transferring a pattern of a mask to a shot region in a substrate by scanning the mask and the substrate relative to a slit- shaped exposure beam, said apparatus comprising:
- a plurality of electrostatic sensors, for sensing a surface position of the shot region, each having a plurality of electrodes arranged in a direction perpendicular to a scanning direction of the mask and the substrate;
- and
- a system which selects at least one electrode from said plurality of electrodes of one of said plurality of electrostatic sensors based on layout information of the shot region to be detected, and calculates the surface position based upon an output of said selected at least one electrode.
Dependencies are inferred from the claim text.