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AssigneeHitachi High-Technologies Corporation
InventorsHiroshi Miyai, Ryuichi Funatsu, Taku Ninomiya, Yasuhiko Nara
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A circuit pattern inspection method and apparatus capable of readily setting an optimum threshold value while it is confirmed that a defect detected when a defect is checked can be detected at what threshold value and capable of forming a recipe easily. A circuit pattern inspection of irradiating an electron beam to a specimen formed with a circuit pattern on a surface thereof, forming an inspection image and a reference image in accordance with a secondary electron of a reflected electron from the specimen, and acquiring an abnormal portion from a difference between the inspection image and the reference image, wherein a plurality of characteristic quantities of the abnormal portion are obtained from an image of the abnormal portion, and the abnormal portion is selectively displayed by changing an inspection threshold value virtually set for the characteristic quantities.
A circuit pattern inspection method of irradiating an electron beam to a specimen formed with a circuit pattern on a surface thereof, forming an inspection image and a reference image in accordance with a secondary electron of a reflected electron from the specimen, and acquiring an abnormal portion from a comparison of an inspection threshold value with a difference between the inspection image and the reference image, the method comprising steps of:
A circuit pattern inspection apparatus for irradiating an electron beam to a specimen formed with a circuit pattern on a surface thereof, forming an inspection image and a reference image in accordance with a secondary electron of a reflected electron from the specimen, and acquiring an abnormal portion from a comparison of an inspection threshold value with a difference between the inspection image and the reference image, the apparatus comprising:
Dependencies are inferred from the claim text.