Precursors for film formation
AssigneeIntel Corporation
InventorsMichael L. McSwiney, Huey-Chiang Liou, Michael D. Goodner, Robert E. Leet, Robert P. Meagley
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AssigneeIntel Corporation
InventorsMichael L. McSwiney, Huey-Chiang Liou, Michael D. Goodner, Robert E. Leet, Robert P. Meagley
Estimating the term…
A method including introducing a precursor in the presence of a circuit substrate, and forming a film including a reaction product of the precursor on the substrate, wherein the precursor includes a molecule comprising a primary species of the film and a modifier. A method including introducing a precursor in the presence of a circuit substrate, the precursor including a primary species and a film modifier as a single source, and forming a film on the circuit substrate. An apparatus including a semiconductor substrate, and a film on a surface of the semiconductor substrate, the film including a reaction product of a precursor including a molecule comprising a primary species and a modifier.
A method comprising:
A method comprising:
An apparatus comprising:
Dependencies are inferred from the claim text.