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US 7,070,908 B2Granted
Feature formation in thick-film inks
AssigneeAgilent Technologies, Inc.
InventorMarvin Glenn Wong
Life of this patent
Estimating the term…
Abstract
In a method for forming one or more features in a thick-film ink deposited on a substrate, a photoimagable material is used to define a negative of the one or more features on the substrate. A thick-film ink is then deposited on at least part of the substrate, abutting at least some of the photoimagable material. The thick-film ink is cured, and the photoimagable material is removed. One embodiment of the method is used to produce a channel plate. Another embodiment of the method is used to produce a switch.
Claims19
A method for forming a switch, comprising:
- a) using a photoimagable material to define negatives of one or more channels on a substrate;
- b) depositing a thick-film ink on at least part of the substrate, abutting at least some of the photoimagable material;
- c) curing the thick-film ink;
- d) removing the photoimagable material to create a channel plate;
- and
- e) aligning the one or more channels in the channel plate with at least one feature on a substrate, and sealing at least a switching fluid between the channel plate and the substrate.
3 more elements
The method of claim, further comprising:
- depositing a plurality of wettable pads in the one or more channels on the substrate;
- and
- depositing the switching fluid on the wettable pads.
Dependencies are inferred from the claim text.