Acrylic resin composition organosiloxane resin composition and laminate comprising the same

An acrylic resin composition comprising components (A) to (E), wherein

• the component (A) is an acrylic copolymer which comprises 50 mol % or more of a recurring unit represented by the following formula (A-1):
• wherein R1 is a methyl group or ethyl group,
• 5 to 30 mol % of a recurring unit represented by the following formula (A-4):
• wherein R2 is an alkylene group having 2 to 5 carbon atoms,
• and 0 to 30 mol % of a recurring unit represented by the following formula (A-3):
• wherein Y is a hydrogen atom or methyl group, and R3 is at least one group selected from the group consisting of hydrogen atom, alkyl group having 2 to 5 carbon atoms and ultraviolet light absorbing residue, with the proviso that a case where Y is a methyl group and R3 is a methyl group or ethyl group is excluded;
• the component (B) is a polyisocyanate compound and/or a blocked polyisocyanate compound having an isocyanate group content of 0.7 to 5 equivalents based on 1 equivalent of the hydroxy group of the component (A);
• the component (C) is a curing catalyst which is contained in an amount of 0 to 0.4 part by weight based on 100 parts by weight of the total of the components (A) and (B);
• the component (D) is an ultraviolet light absorber which is contained in an amount of 10 to 50 parts by weight based on 100 parts by weight of the total of the components (A) and (B);
• and
• the component (E) is a silane coupling agent which is contained in an amount of 0 to 5 parts by weight based on 100 parts by weight of the total of the components (A) and (B).

An organosiloxane resin composition comprising components (a) to (e), wherein

• the component (a) is colloidal silica;
• the component (b) is a hydrolysate(s) and/or condensate(s) of alkoxysilanes represented by the following formulas (b-1) to (b-3):
• Q1Si(OQ3)3 (b-1)
• Q1Q2Si(OQ3)2 (b-2)
• Si(OQ3)4 (b-3)
• wherein Q1 and Q2 are each an alkyl group having 1 to 4 carbon atoms, vinyl group or alkyl group having 1 to 3 carbon atoms substituted by at least one group selected from the group consisting of methacryloxy group, amino group, glycidoxy group and 3,4-epoxycyclohexyl group, and Q3 is an alkyl group having 1 to 4 carbon atoms,
• the molar ratio of Si derived from the component (a) to Si derived from the component (b) in the resin composition (Sia/Sib) is 2/8 to 4/6,
• the (b-1)/(b-2)/(b-3) ratio of the above components being 80-100/0-20/0-20;
• the component (c) is a curing catalyst;
• the component (d) is a solvent;
• and
• the component (e) is an acrylic copolymer comprising 50 to 90 mol % of a recurring unit represented by the following formula (A-1):
• wherein R1 is a methyl group or ethyl group,
• and 10 to 50 mol % of a recurring unit represented by the following formula (A-4):
• wherein R2 is an alkylene group having 2 to 5 carbon atoms,
• in an amount of 0.1 to 20 parts by weight based on 100 parts by weight of the organosiloxane resin composition.

An organosiloxane resin composition comprising components (a) to (d), wherein

• the component (a) is colloidal silica;
• the component (b) is a hydrolysate(s) and/or condensate(s) of alkoxysilanes represented by the following formulas (b-1) to (b-3):
• Q1Si(OQ3)3 (b-1)
• Q1Q2Si(OQ3)2 (b-2)
• Si(OQ3)4 (b-3)
• wherein Q1 and Q2 are each an alkyl group having 1 to 4 carbon atoms, vinyl group or alkyl group having 1 to 3 carbon atoms substituted by at least one group selected from the group consisting of methacryloxy group, amino group, glycidoxy group and 3,4-epoxycyclohexyl group, and Q3 is an alkyl group having 1 to 4 carbon atoms,
• the (b-1)/(b-2)/(b-3) ratio of the above components being 80-100/0-20/0-20;
• the component (c) is a curing catalyst;
• the component (d) is a solvent;
• and
• the molar ratio of Si derived from the component (a) to Si derived from the component (b) in the resin composition (Sia/Sib) is 2/8 to 4/6,
• wherein when the silicon nuclear magnetic resonance spectrum (29Si-NMR) of the organosiloxane resin composition was measured using deuterium oxide (D2O) as a measurement solvent at a measurement frequency of 79 MHz, a measurement pulse of 6.0 μs, a repetition time of 30 sec. and a broadening factor of 5 Hz, the chemical shifts of the silicon atoms of the organosiloxane resin composition satisfy the following expressions:
• 0.002≦[X]/[S]≦0.2 and 0.6≦[Y]/[Z]≦3
• wherein [S] is the integrated value of all the peaks at a range from −46.5 ppm to −70.0 ppm, [X]is the integrated value of all the peaks at a range from −46.5 ppm to −48.5 ppm, [Y] is the integrated value of all the peaks at a range from −52.5 ppm to −61.0 ppm, and [Z] is the integrated value of all the peaks at a range from −61.0 ppm to −70.0 ppm when the peak of the silicon atom of tetramethylsilane is at 0 ppm.