Manufacturing method of fine structure, optical element, integrated circuit, and electronic instrument
AssigneeSeiko Epson Corporation
InventorsKenichi Takagi, Tomohiko Sogo, Yuji Saito
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Abstract
A fine structure manufacturing method is provided. The method comprises providing a lyophilic film on a treated surface of a substrate on which a pattern having a desired form is to be formed, providing a liquid-repellent film on an upper surface of the lyophilic film, the liquid-repellent film having liquid repellency relative to a liquid material used for forming the pattern, and eliminating a part of the liquid-repellent film located on an area where the pattern is to be formed.
Claims9
A fine structure manufacturing method for forming a pattern on a member comprising the steps of:
- providing a first film on a treated surface of the member;
- providing a liquid-repellent film on an upper surface of the first film, the liquid-repellent film having liquid repellency to a liquid material to be applied to the pattern;
- eliminating part of the liquid-repellent film which corresponds to an area where the pattern is to be formed:
- filling in the area where the liquid-repellent film is eliminated with the liquid material;
- and
- at least one of drying and baking the liquid material to form the pattern on the area where the liquid material is filled.
A fine structure manufacturing method comprising the steps of:
- providing a first film on a treated surface;
- providing a liquid-repellent film on an upper surface of the first film, the liquid-repellent film having liquid repellency to a liquid material:
- eliminating the liquid-repellent film at a boundary of an area where a pattern is to be formed;
- and
- filling in the area where the liquid-repellent film is eliminated with the liquid material.
A fine structure manufacturing method for forming a pattern on a member comprising the steps of:
- providing a lyophilic film on a treated surface of the member, the lyophilic film having a lyophilic property relative to a liquid material employed for forming the pattern;
- providing a decomposition acceleration layer on an upper surface of the lyophilic film, the decomposition acceleration layer accelerating a decomposition of a liquid-repellent film, the liquid-repellent film having liquid repellency relative to the liquid material;
- providing the liquid-repellent film on an upper surface of the decomposition acceleration layer;
- eliminating part of the liquid-repellent film which is located on an area where the pattern is to be formed:
- filling in the area where the liquid-repellent film is eliminated with the liquid material;
- and
- at least one of drying and baking the liquid material to form the pattern on the area where the liquid material is filled.
Dependencies are inferred from the claim text.