Vacuum suction membrane for holding silicon wafer
AssigneeUnited Microelectronics Corp.
InventorsTzu-Shin Chen, Ming-Hsing Kao, Wen-Chin Lin, Hua-Bin Chi
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Abstract
A membrane for vacuum suction of a silicon water typically used inside a polishing head. The membrane has a flat main body and a plurality of protrusions each having a spiny shape over the surface of the flat main body. The protrusions are formed in positions that correspond to the holes of a supporting multiple-hole panel. The protrusions on the flat main body lower the suction pressure between the wafer and the membrane somewhat so that wafer unloading failure is minimized.
Claims15
A membrane for vacuum suction of a silicon wafer, wherein the membrane is particularly suitable for wrapping a panel having a plurality of holes thereon inside a polishing head, comprising:
- a flat main body;
- and
- a plurality of protrusions distributed on a surface of the flat main body of the membrane, wherein the protrusions on the membrane are placed in positions that correspond to the holes on the multiple-hole panel, wherein the protrusion has a particle shape, and a number of protrusions for each corresponding hole having a larger size is greater than a number of protrusions for each corresponding hole having a smaller size.
A wafer suction device coupled to an external vacuum-driving system, comprising:
- a multiple-hole panel having a bottom section and a plurality of holes therein;
- and
- a membrane wrapping around the bottom section of the multiple-hole panel, the membrane comprising:
- a flat main body;
- and
- a plurality of protrusions distributed on a surface of the flat main body of the membrane, wherein the protrusions on the membrane are placed in positions that correspond to the holes on the multiple-hole panel, wherein the protrusion has a particle shape, and a number of protrusions for each corresponding hole having a larger size is greater than a number of protrusions for each corresponding hole having a smaller size.
A vacuum suction polishing head having a gripping pan, the inside of the gripping pan comprising:
- a multiple-hole panel having a plurality of holes thereon;
- and
- a membrane at the bottom section of the multiple-hole panel, wherein a surface of the membrane has a plurality of protrusions, wherein the protrusion has a particle shape, and a number of protrusions for each corresponding hole having a larger size is greater than a number of protrusions for each corresponding hole having a smaller size.
A membrane for vacuum suction of a silicon wafer, wherein the membrane is particularly suitable for wrapping a panel having a plurality of holes thereon inside a polishing head, comprising:
- a flat main body without hole;
- and
- a plurality of protrusions distributed on a surface of the flat main body of the membrane, wherein the protrusions on the membrane are placed in positions that correspond to the holes on the multiple-hole panel, and a number of protrusions for each corresponding hole having a larger size is greater than a number of protrusions for each corresponding hole having a smaller size.
A wafer suction device coupled to an external vacuum-driving system, comprising:
- a multiple-hole panel having a bottom section and a plurality of holes therein;
- and
- a membrane wrapping around the bottom section of the multiple-hole panel, the membrane comprising:
- a flat main body without hole;
- and
- a plurality of protrusions distributed on a surface of the flat main body of the membrane, wherein the protrusions on the membrane are placed in positions that correspond to the holes on the multiple-hole panel, and a number of protrusions for each corresponding hole having a larger size is greater than a number of protrusions for each corresponding hole having a smaller size.
A vacuum suction polishing head having a gripping pan, the inside of the gripping pan comprising:
- a multiple-hole panel having a plurality of holes thereon;
- and
- a membrane without hole at the bottom section of the multiple-hole panel, wherein a surface of the membrane has a plurality of protrusions, and a number of protrusions for each corresponding hole having a larger size is greater than a number of protrusions for each corresponding hole having a smaller size.
Dependencies are inferred from the claim text.