Polishing method, polishing device, glass substrate for magnetic recording medium, and magnetic recording medium
AssigneeHoya Corporation
InventorTakemi Miyamoto
Life of this patent
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Abstract
There are disclosed a polishing method and a polishing device in which cleaning of a glass substrate surface can be achieved to a high level. A glass substrate (MD substrate 1) in the shape of a circular disc having a circular hole in a center portion is polished with an abrasive liquid 50 containing free abrasive grains being supplied, and an inner peripheral end surface of the glass substrate is polished using the abrasive liquid containing the free abrasive grains by rotating a rotary brush 4 or a polishing pad in contact with the inner peripheral end surface.
Claims14
A polishing method comprising steps of:
- supplying an abrasive liquid containing free abrasive grains to an inner peripheral end surface of a glass substrate in the form of a circular disc having a circular hole in a center portion;
- and rotating a polishing brush or a polishing pad in contact with the inner peripheral end surface of said glass substrate to perform polishing.
A polishing device comprising:
- holding means for stacking and holding a plurality of glass substrates in the form of circular discs having circular holes in center portions;
- rotation means for rotating the holding means;
- a rotary brush inserted to the circular hole portion of said plurality of stacked glass substrates;
- and abrasive liquid supply means for supplying an abrasive liquid to the circular hole portion of said plurality of stacked glass substrates.
Dependencies are inferred from the claim text.