System, apparatus and method for automated tapeout support

A computer implemented method of modifying layout information representing a reticle set design for an integrated circuit, the method comprising the steps of:

• a) receiving and storing layout information representing a reticle set design for an integrated circuit and job information related to said reticle set design;
• the reticle set design is comprised of layers;
• (1) said layout information is in Graphic Design Stream format;
• (2) said layout information is in Graphic Design Stream format and is received from the internet;
• (3) said layout information conforms to a customer process standard;
• a foundry process standard defines at least a foundry scheme for numbering the layers, types of layer, total number of layers, the total number of metal layers and the ground rules;
• said customer process standard differs from a the foundry process standard;
• b) retrieving foundry design data related to said reticle set design;
• (1) said foundry design data is comprised of process data, device data and layer data that is related to foundry process standards;
• c) receiving changes and/or approval to said layout information and job information to change said layout information and said job information from conforming to said customer process standard to conform to said foundry process standard;
• d) checking said layout information and said job information to verify that said layout information and said job layer information are compatible with said foundry process standards;
• (1) the checking of said layout information and job information comprises (a) using a layout information extraction program to extract layer names and layer numbers;
• and (b) an layer verification application that verify said layer names and said layer numbers are compatible with said job information;
• e) checking and modifying said layout info and job information to add features;
• (1) said layout information is modified to add frame layout info;
• (2) said layout information and said job information are modified to make optical proximity corrections;
• (3) said layout information and job information are modified to add dummy active layers;
• (4) said layout information is checked for design rule compliance;
• f) using said layout information and said job information that conform to said foundry process standard to create mask writer format information for said reticle set design and storing said mask writer format information;
• g) receiving changes and/or approval for said mask writer format information;
• h) releasing the mask write format information to a mask shop.

One or more processor readable storage devices having processor readable code embodied on said process readable storage devices, said processor readable code for programming one or more processors to perform a method for modifying layout information for a reticle set design, the method comprising:

• a) receiving layout information and job information;
• and storing said layout information and job information;
• said layout information representing a reticle set design for an integrated circuit;
• and said job information related to said reticle set design;
• said layout information conforms to a customer process standard;
• and
• said customer process standard differs from a foundry process standard;
• the foundry process standard defines at least a foundry scheme for numbering the layers, types of layer, total number of layers, the total number of metal layers and the ground rules;
• b) modifying said layout information and said job information to put said layout information and said job information into said foundry process format;
• c) using said layout information and said job information to create mask writer format information for said reticle set design;
• and storing mask writer format information;
• and
• d) outputting said mask writer format information.

One or more processor readable storage devices having processor readable code embodied on said process readable storage devices, said processor readable code for programming one or more processors to perform a method for modifying layout information for a reticle set design, the method comprising:

• a) receiving and storing layout information representing a reticle set design for an integrated circuit and job information related to said reticle set design;
• b) said layout information and said job information is received from a customer and said layout information conforms to a customer process standard;
• said customer process standard differs from a foundry process standard;
• the foundry process standard defines at least a foundry scheme for numbering the layers, types of layers, total number of layers, the total number of metal layers and the ground rules;
• c) retrieving foundry design data related to said reticle set design;
• d) receiving changes and/or approval to said layout information and job information whereby the layout information and job information conform to foundry process standards;
• e) checking said layout information and said job information to verify that said layout information and said job layer information are compatible with said foundry process standards;
• f) chucking and modifying said layout info and job information to add features;
• g) using said layout information and said job information to create mask writer format information for said reticle set design and storing said mask writer format information;
• h) receiving changes and/or approval for said mask writer format information;
• and
• i) releasing the mask writer format information to a mask shop.

One or more processor readable storage devices having processor readable code embodied on said process readable storage devices, said processor readable code for programming one or more processors to perform a method for modifying layout information for a reticle set design, the method comprising:

• a) receiving and storing layout information representing a reticle set design for an integrated circuit and job information related to said reticle set design;
• the reticle set design is comprised of layers;
• (1) said layout information is in Graphic Design Stream format;
• (2) said layout information is in Graphic Design Stream format and is received from the internet.
• (3) said layout information conforms to a customer process standard;
• a foundry process standard defines at least a foundry scheme for numbering the layers, types of layers, total number of layers, the total number of metal layers and the ground rules;
• said customer process standard differs from a the foundry process standard;
• b) retrieving foundry design data related to said reticle set design;
• (1) said foundry design data is comprised of process data, device data and layer data thaL is related to said foundry process sLandards;
• c) receiving changes and/or approval to said layout information and job information to change said layout information and said job information from conforming to said customer process standard to conform to said foundry process standard;
• d) checking said layout information and said job information to verify that said layout information and said job layer information are compatible with said foundry process standards;
• (1) the checking of said layout information and job information comprises (a) using a layout intbrmation extraction program to extract layer names and layer numbers;
• and (b) a layer verification application that verify said layer names and said layer number are compatible with said job information.
• e) checking and modifying said layout info and job information to add features;
• (1) said layout information is modified to add frame layout info;
• (2) said layout information and said job information are modified to make optical proximity corrections;
• (3) said layout information and job information are modified to add dummy active layers;
• (4) said layout information is checked for design rule compliance;
• f) using said layout information and said job information that conform to said foundry process standard to create mask writer format information for said reticle set design and storing said mask writer format information;
• g) receiving changes and/or approval for said mask writer format information;
• and
• h) releasing the mask write format information to a mask shop.

A computer system for modifying layout information representing a reticle set design, the method comprising the steps of:

• a) receiving and storing layout information representing a reticle set design for an integrated circuit and job information related to said reticle set design;
• (1) said layout information conforms to a customer process standard;
• a foundry process standard defines at least a foundry scheme for numbering the layers, types of layers, total number of layers, the total number of metal layers and the ground rules;
• said customer process standard differs from a foundry process standard;
• b) retrieving foundry design data related to said reticle set design;
• c) receiving changes and/or approval to said layout information and job information to change said layout information and said job inftrmation from conforming to said customer process standard to conform to said foundry process standard;
• d) checking said layout information and said job information to verify that said layout information and said job layer information are compatible with said foundry process standards;
• e) checking and modifying said layout info and job infonnation to add features;
• f) using said layout information and said job information to create mask writer format information for said reticle set design and storing said mask writer format information;
• g) receiving changes and/or approval for said mask writer format information;
• h) releasing the mask write format information to a mask shop.