Exposure head and exposure apparatus

An exposure head comprising:

• a light source unit including a plurality of laser emission portions which emit laser beams;
• a spatial modulation element for modulating the laser beams, including a plurality of pixel portions which change light modulation states in accordance with respective control signals, the pixel portions being arranged in a two-dimensional pattern on a predetermined support;
• a first optical system for focusing images of the pixel portions of the spatial modulation element;
• a plurality of first microlenses for focusing the laser beams, the first microlenses being two-dimensionally arranged at focusing positions of the plurality of pixel portions, at a pitch which is substantially the same as a size of images that are formed at the focusing positions;
• and
• a plurality of second microlenses disposed at back side focusing positions of the plurality of first microlenses, the second microlenses focusing real images of the pixel portions respectively on a surface that is to be exposed,
• wherein the real images of the pixel portions, which are focused by the second microlenses, serve as beam spots for exposing the surface that is to be exposed.

An exposure head comprising:

• a light source unit including a laser beam;
• a spatial modulation element for modulating the laser beam, including a plurality of pixel portions which change light modulation states in accordance with respective control signals, the pixel portions being arranged in a two-dimensional pattern on a predetermined support;
• a first optical system for focusing images of the pixel portions of the spatial modulation element;
• and
• a plurality of first microlenses arranged in a two-dimensional pattern so as to correspond to the pixel portions, the first microlenses being respectively supported at respective focusing positions of the pixel portions,
• wherein light source images of the laser emission portions, which are formed at back side focusing positions of the first microlenses, are projected to a surface that is to be exposed, and the light source images serve as beam spots for exposing the surface that is to be exposed.

An exposure head comprising:

• a light source unit including a laser beam;
• a spatial modulation element for modulating the laser beam, including a plurality of pixel portions which change light modulation states in accordance with respective control signals, the pixel portions being arranged in a two-dimensional pattern on a predetermined support;
• a first optical system for focusing images of the pixel portions of the spatial modulation element;
• a plurality of first microlenses for focusing the laser beam, the first microlenses being two-dimensionally arranged at focusing positions of the plurality of pixel portions, at a pitch which is substantially the same as a size of images that are formed at the focusing positions;
• and
• a plurality of second microlenses disposed at back side focusing positions of the plurality of first microlenses, the second microlenses focusing real images of the pixel portions respectively on a surface that is to be exposed,
• wherein the real images of the pixel portions, which are focused by the second microlenses, serve as beam spots for exposing the surface that is to be exposed.