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US 7,068,352 B2Granted
Exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorNaoki Irie
Life of this patent
Estimating the term…
Abstract
An exposure apparatus for scanning and exposing an object includes a surrounding member for surrounding a space around the object, and a gas supplier for supplying a gas to the space in two directions which are substantially parallel to a scanning direction.
Claims11
An exposure apparatus for exposing an object to a pattern of a reticle, said exposure apparatus comprising:
- a scanning portion for scanning the reticle in synchronization with the object;
- a projection optical system for projecting the pattern onto the object;
- a surrounding member for surrounding a space between the projection optical system and the object;
- and
- a gas supplier for supplying gas to the space in a direction which is substantially parallel to a scanning direction;
- and
- a barrel having a first ventilation to flow the gas supplied by the gas supplier, said barrel accommodates the projection optical system,
- wherein the surrounding member is detachably connected to the projection optical system and has a second ventilation to flow the gas supplied by the gas supplier,
- wherein said first ventilation and second ventilation are connected, and
- wherein said gas supplier supplies gas to the space though the first ventilation and second ventilation.
7 more elements
An exposure apparatus for exposing a pattern of a reticle onto an object by scanning the reticle and the object, said exposure apparatus comprising:
- a projection optical system for projecting the pattern onto the object;
- a surrounding member, provided between the projection optical system and the object and spaced from the object, for keeping airtight a space around the object in cooperation with the projection optical system;
- and
- a gas supplier for supplying gas to the space in a direction parallel to a scanning direction and
- a barrel having a first ventilation to flow the gas supplied by the gas supplier, said barrel accommodates the projection optical system,
- wherein the surrounding member is detachably connected to the projection optical system and has a second ventilation to flow the gas supplied by the gas supplier,
- wherein said first ventilation and second ventilation are connected, and
- wherein said gas supplier supplies gas to the space though the first ventilation and second ventilation.
5 more elements
Dependencies are inferred from the claim text.