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AssigneeASML Netherlands B.V.
InventorsNorbertus Josephus Martinus Van Den Nieuwelaar, Johannes Onvlee, Roel Boumen
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A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.
A method of controlling a track apparatus in a lithocell apparatus arrangement wherein said lithocell apparatus arrangement includes a lithographic exposure apparatus configured to expose substrates and the track apparatus configured to prepare substrates before exposure and develop substrates after exposure, said method comprising:
A device manufacturing method, comprising:
A lithocell apparatus arrangement, comprising:
A computer program comprising a computer-readable storage medium having recorded thereon executable instructions that are adapted to control at least part of a lithocell apparatus arrangement, wherein said lithocell apparatus arrangement comprises a track apparatus for preparing substrates for exposure and developing exposed substrates and an associated lithographic exposure apparatus for exposing substrates, said executable instructions comprising:
Dependencies are inferred from the claim text.