Method for making potassium niobate thin film, surface acoustic wave element, frequency filter, frequency oscillator, electronic circuit and electronic apparatus
AssigneeSeiko Epson Corporation
InventorsTakamitsu Higuchi, Setsuya Iwashita, Hiromu Miyazawa
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Abstract
A method is provided for forming a potassium niobate thin film in which, in a process of manufacturing a surface acoustic wave element, a conductive thin film included in the surface acoustic wave element is used as an electrode for applying an electric field to the potassium niobate thin film that is to serve as the piezoelectric layer of the surface acoustic wave element to polarize it. A surface acoustic wave element, a frequency filter, a frequency oscillator, an electronic circuit, and an electronic apparatus are also provided.
Claims14
A method for making a potassium niobate film comprising:
- depositing a potassium niobate film above a substrate;
- depositing a first conductive film on the potassium niobate film;
- applying an electric field to the potassium niobate film;
- and
- after the step of applying the electric field to the potassium niobate film, forming IDT electrodes by patterning the first conductive film;
- wherein, before the potassium niobate film is deposited above the substrate, a second conductive film is deposited above the substrate.
A method for making a potassium niobate film comprising:
- depositing a potassium niobate film above a substrate;
- depositing a first conductive film on the potassium niobate film;
- depositing a second conductive film under the substrate;
- applying an electric field to the potassium niobate film;
- and
- after the step of applying the electric field to the potassium niobate film, forming IDT electrodes by patterning the first conductive film.
Dependencies are inferred from the claim text.