Power semiconductor switching element
AssigneeKabushiki Kaisha Toshiba
InventorsIchiro Omura, Wataru Saito, Tsuneo Ogura, Hiromichi Ohashi, Yoshihiko Saito, Kenichi Tokano
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AssigneeKabushiki Kaisha Toshiba
InventorsIchiro Omura, Wataru Saito, Tsuneo Ogura, Hiromichi Ohashi, Yoshihiko Saito, Kenichi Tokano
Estimating the term…
A semiconductor element of this invention includes a drift layer of a first conductivity type formed on a semiconductor substrate of the first conductivity type, a well layer of a second conductivity type selectively formed in the surface of the drift layer, a source layer of the first conductivity type selectively formed in the surface of the well layer, a trench formed to reach at least the inside of the drift layer from the surface of the source layer through the well layer, a buried electrode formed in the trench through a first insulating film, and a control electrode formed on the drift layer, the well layer, and the source layer through a second insulating film.
A semiconductor element comprising:
Dependencies are inferred from the claim text.