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US 7,067,832 B2Granted
Extreme ultraviolet light source
AssigneeGigaphoton Inc.
InventorsHakaru Mizoguchi, Akira Endo, Hirokazu Tanaka
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AssigneeGigaphoton Inc.
InventorsHakaru Mizoguchi, Akira Endo, Hirokazu Tanaka
Estimating the term…
An extreme ultraviolet light source device which makes it possible to increase a working distance and obtain extreme ultraviolet light with a high output. The extreme ultraviolet light source device generates a plasma by irradiating a target (22) with laser light from a driving laser device (25), and generates extreme ultraviolet (EUV) light with a wavelength of several nanometers to several tens of nanometers. The extreme ultraviolet light source device comprises a target supply device which has a charge applying unit (23) that applies a charge to the target (22), and an acceleration unit (24) which accelerates the charged target (22) using an electromagnetic field. The target supply device supplies the target (22) comprised of a rare gas element such as xenon (Xe) or the like, or a metal such as lithium (Li), tin (Sn), tin oxide (SnO2) or the like, as ionized molecules, atoms or masses comprising a plurality of atoms, or as ionized clusters.
An extreme ultraviolet light source device which generates a plasma by irradiating a target (22) with laser light from a driving laser device (25), and which generates extreme ultraviolet (EUV) light having a wavelength of several nanometers to several tens of nanometers, said light source device comprising a target supply device that has charge applying means (23) that applies a charge to the target (22), and acceleration means (24) that accelerates the charged target using an electromagnetic field toward a plasma generation position where laser light and the target collide.
Dependencies are inferred from the claim text.