Position detection method and apparatus
AssigneeCanon Kabushiki Kaisha
InventorsTakehiko Suzuki, Hideki Ina, Koichi Sentoku, Satoru Oishi
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Abstract
A reticle stage reference mark 3 of material having high reflectivity to alignment illumination light is provided on a reticle 5, and a chuck mark 8 of material having high reflectivity to the alignment illumination light is provided on a wafer chuck 11. A relative position of the reticle stage reference mark 3 to the chuck mark 8 is detected by using a first position detection optical system 1 and a first illumination optical system 2, and relative alignment is performed between the reticle 5 and a wafer 10.
Claims15
An exposure method for projecting a pattern formed on a reflection plate onto a substrate, via a projection optical system, using extreme ultraviolet light, said method comprising:
- a first detection step of detecting a relative position between a first mark formed on a substrate holding unit for holding the substrate and a second mark formed on a plate holding unit for holding the reflection plate, using non-exposure light, which travels via the first mark, the projection optical system and the second mark;
- and
- a second detection step of detecting a relative position between the second mark and a third mark formed on the reflection plate, said second detection step comprising sub-steps of:
- (i) detecting light reflected from the second mark with a detector,
- (ii) detecting light reflected from the third mark with the detector, and
- (iii) changing a relative position between the plate holding unit and the detector between said sub-steps (i) and (ii).
An exposure apparatus for projecting a pattern formed on a reflection plate, held by a plate holding unit, onto a substrate using extreme ultraviolet exposure light, said apparatus comprising:
- a projection optical system which projects the pattern onto the substrate with the exposure light reflected from the reflection plate;
- a substrate holding unit which holds the substrate;
- a first detecting system which detects a relative position between a first mark formed on said substrate holding unit and a second mark formed on the plate holding unit, using non-exposure light which travels via the first mark, the projection optical system and the second mark;
- and
- a second detecting system which has a detector and detects a relative position between the second mark and a third mark formed on the reflection plate, wherein the second and third marks are detected at respective relative positions between said detector and the plate holding unit.
Dependencies are inferred from the claim text.