Infrared absorption measurement method, infrared absorption measurement device, and method of manufacturing semiconductor device
AssigneeSeiko Epson Corporation
InventorIsamu Namose
Life of this patent
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Abstract
An infrared absorption measurement method including: (a) measuring infrared absorption of a target component in a sample gas while decompressing the sample gas so that an absorption area in a peak region of the target component in the infrared absorption shown in a graph is within a predetermined range, the graph showing the relationship between the wave number and absorbance of the sample gas; and (b) calculating the concentration of the target component in the sample gas based on the absorption area and pressure of the decompressed sample gas.
Claims11
An infrared absorption measurement method comprising:
- (a) measuring infrared absorption of a target component in a sample gas while decompressing the sample gas so that an absorption area in a peak region of the target component in the infrared absorption shown in a graph is within a predetermined range, the graph showing the relationship between the wave number and absorbance of the sample gas;
- and
- (b) calculating the concentration of the target component in the sample gas based on the absorption area and pressure of the decompressed sample gas.
An infrared absorption measurement device comprising:
- a pump which decompresses a sample gas including a target component;
- an infrared absorption analysis device which measures infrared absorption of the target component in the sample gas decompressed by the pump;
- and
- a feedback mechanism which adjusts the pressure of the sample gas so that an absorption area in a peak region of the target component in the infrared absorption shown in a graph is within a predetermined range, the graph showing the relationship between the wave number and absorbance of the sample gas.
Dependencies are inferred from the claim text.