Method and apparatus for multiple charged particle beams
AssigneeApplied Materials, Inc.
InventorsChiwoei Wayne Lo, Xinrong Jiang
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AssigneeApplied Materials, Inc.
InventorsChiwoei Wayne Lo, Xinrong Jiang
Estimating the term…
A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.
A magnetic focusing lens apparatus for focusing multiple substantially parallel charged particle beams, comprising:
A multi-source charged particle gun apparatus for generating a plurality of substantially parallel charged particle beams, comprising:
A charged particle multi-beam column apparatus for imaging with a plurality of substantially parallel focused charged particle beams, comprising:
A multi-beam inspection system comprising:
Dependencies are inferred from the claim text.