Electron beam system and electron beam measuring and observing method
AssigneeTopcon Corporation
InventorsNobuo Kochi, Hiroyuki Aoki
Life of this patent
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AssigneeTopcon Corporation
InventorsNobuo Kochi, Hiroyuki Aoki
Estimating the term…
This invention provides an electron beam measuring device capable of performing three-dimensional image measurement of a sample with high precision, irrespective of the tilt angle and height of the sample, by adjusting an electron optical system of a scanning charged-particle beam device so as to be suitable for image measurement. The electron beam measuring device includes a measuring section 20 adapted to tilt a reference template held by a sample holder 3 and an irradiated electron beam 7 relative to each other by means of a sample tilting section 5, to find the shape or coordinate values of the reference template based on a stereo image photographed by an electron beam detecting section 4, a calibration data preparing section 30 for comparing the measuring results at the measuring section 20 with known reference data to prepare calibration data for a stereo image photographed by the electron beam measuring device, and a calibration section 40 for performing a calibration based on the calibration data so as to reduce aberration in an image of the sample detected by the electron beam detecting section 4. Based on the stereo image calibrated by the calibration section 40, the shape or coordinate values of the sample 9 are found.
An electron beam system, comprising:
An electron beam system, connected to an electron beam device including an electron beam source for emitting an electron beam;
An electron beam measuring method, using an electron beam system including an electron beam source for emitting an electron beam, an electron optical system for irradiating the electron beam on a sample, a sample holder for holding the sample, a sample tilting section for tilting the sample holder and the irradiated electron beam relative to each other so that a stereo image can be acquired, and an electron beam detecting section for detecting an electron beam outgoing from the sample, wherein a computer is caused to perform:
An electron beam measuring method, using an electron beam system including an electron beam source for emitting an electron beam, an electron optical system for irradiating the electron beam on a sample, a sample holder for holding the sample, a sample tilting section for tilting the sample holder and the irradiated electron beam relative to each other so that a stereo image can be acquired, and an electron beam detecting section for detecting an electron beam outgoing from the sample, wherein a computer is caused to perform:
An electron beam measuring method, using an electron beam system including an electron beam source for emitting an electron beam, an electron optical system for irradiating the electron beam on a sample, a sample holder for holding the sample, a sample tilting section for tilting the sample holder and the irradiated electron beam relative to each other so that a stereo image can be acquired, and an electron beam detecting section for detecting an electron beam outgoing from the sample, wherein a computer is caused to perform:
An electron beam system, comprising:
An electron beam system, comprising:
An electron beam system, comprising:
Dependencies are inferred from the claim text.