Atmospheric glow discharge with concurrent coating deposition
AssigneeSigma Laboratories of Arizona, Inc.
InventorsMichael G. Mikhael, Angelo Yializis, Richard E. Ellwanger
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AssigneeSigma Laboratories of Arizona, Inc.
InventorsMichael G. Mikhael, Angelo Yializis, Richard E. Ellwanger
Estimating the term…
A plasma is produced in a treatment space by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes separated by a dielectric material, a precursor material is mixed with the plasma, and a substrate film or web is coated by vapor deposition of the vaporized substance at atmospheric pressure in the plasma field. The deposited precursor is cured by electron-beam, infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being-deposited. Plasma pre-treatment and post-treatment steps are used to enhance the properties of the resulting coated products. Similar results are obtained by atomizing and spraying the liquid precursor in the plasma field.
A method for manufacturing a coated substrate by a process of vapor deposition and concurrent glow-discharge plasma treatment at substantially atmospheric pressure, comprising the following steps:
A method for manufacturing a coated substrate by a process of vapor deposition and concurrent glow-discharge plasma treatment at substantially atmospheric pressure, comprising the following steps:
Dependencies are inferred from the claim text.