Titanium carboxylate films for use in semiconductor processing
AssigneeSimon Foster University
InventorsRoss H. Hill, Paul J. Roman, Jr., Seigi Suh, Xin Zhang
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Abstract
The present invention involves the formation of titanium carbonate films that exhibit improved hydrolytic stability and photosensitivity. Such films can be used in semiconductor processing to deposit titanium and titanium oxide layers on a substrate and to form patterns without the use of photoresists. Preferred titanium carboxylates are non-branched and branched carboxylates wherein the alkoxide component is an alcohol, branched titanium carboxylates wherein the alkoxide component is a diol, non-branched and branched titanium alpha hydroxy carboxylate compounds, and titanium dicarboxylate compounds.
Claims29
A photosensitive and hydrolytically stable amorphous titanium carboxylate film wherein said film is deposited on a substrate and wherein said film is formed from a combination comprising:
- (A) one or more titanium alkoxide;
- (B) one or more solvent;
- and (C) one or more acid ligand.
A hydrolytically stable amorphous titanium carboxylate film wherein said film is deposited on a substrate and wherein said film is formed from a combination comprising:
- (A) one or more titanium alkoxide;
- (B) one or more solvent;
- and (C) one or more acid ligand.
A photosensitive titanium carboxylate film wherein said film is deposited on a substrate wherein the titanium carboxylate film is formed from a solid precursor that was purified before use and wherein said film is formed from a combination comprising:
- (A) one or more titanium alkoxide;
- (B) one or more solvent;
- and (C) one or more acid ligand.
A method for depositing a metal containing layer on a substrate, the method which comprises the steps of:
- a) providing a titanium carboxylate precursor;
- b) depositing said precursor as a film on a substrate, wherein said film is hydrolytically stable and amorphous, wherein said film is formed from a combination comprising:
- (A) one or more titanium alkoxide;
- (B) one or more solvent;
- and (C) one or more acid ligand.
A method for depositing a metal containing layer on a substrate, the method which comprises the steps of:
- a) providing a titanium carboxylate precursor;
- b) depositing said precursor as a film on a substrate, wherein said film is photosensitive, the titanium carboxylate precursor is a solid and the precursor is purified before depositing as a film and wherein said film is formed from a combination comprising:
- (A) one or more titanium alkoxide;
- (B) one or more solvent;
- and (C) one or more acid ligand.
A method for depositing a metal containing layer on a substrate, the method which comprises the steps of:
- a) providing a titanium carboxylate precursor;
- b) depositing said precursor as a film on a substrate, wherein said film is hydrolytically stable, photosensitive, and amorphous and is formed from a combination comprising:
- (A) one or more titanium alkoxide;
- (B) one or more solvent;
- and (C) one or more acid ligand.
Dependencies are inferred from the claim text.