Method of manufacturing member pattern, method of manufacturing wiring structure, method of manufacturing electron source, and method of manufacturing image display device

A method of manufacturing a member pattern having a patterned member on a substrate, comprising:

• a first exposure step of exposing a desired region of a negative type photosensitive material applied to the substrate to light from a first direction;
• a development step of performing development after said first exposure step to form a precursor pattern of said member;
• a second exposure step of exposing the precursor pattern of said member to light from a second direction opposite to said first direction;
• and
• a step of baking said precursor pattern after said second exposure step.

A method of manufacturing a wiring structure having, on a substrate, a first wiring and a second wiring intersecting said first wiring and disposed over the first wiring through an insulator,

• wherein a process of forming said insulator comprises:
• a first exposure step of exposing a desired region of a negative type photosensitive insulating material to light from a first direction, the negative type photosensitive insulating material being applied to extend over said substrate and the first wiring disposed on the substrate;
• a second exposure step of exposing the desired region of the negative type photosensitive insulating material to light from a second direction opposite to said first direction;
• a step of performing development after said exposure steps to form a precursor pattern of said insulator;
• and a step of baking the precursor pattern of said insulator.

A method of manufacturing a wiring structure having, on a substrate, a first wiring and a second wiring intersecting said first wiring and disposed over the first wiring through an insulator,

• wherein a process of forming said insulator comprises:
• a first exposure step of exposing a desired region of a negative type photosensitive insulating material to light from a first direction, the negative type photosensitive insulating material being applied to extend over said substrate and the first wiring disposed on the substrate;
• a step of performing development after said first exposure step to form a precursor pattern of said insulator;
• a second exposure step of exposing the precursor pattern of said insulator to light from a second direction opposite to said first direction;
• and a step of baking the precursor pattern after said second exposure step.