Polymers, resist compositions and patterning process
AssigneesShin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd., Central Glass Company, Limited
InventorsYuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Kazuhiko Maeda, Haruhiko Komoriya, Kazuhiro Yamanaka
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Abstract
A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance
Claims7
A polymer comprising recurring units having a partial structure of the general formula (1) and having a weight average molecular weight of 1,000 to 500,000,
- wherein R1 is a single bond or a straight, branched or cyclic alkylene or fluorinated alkylene group of 1 to 20 carbon atoms, R2 and R3 each are hydrogen or a straight, branched or cyclic alkyl or fluorinated alkyl group of 1 to 20 carbon atoms, at least one of R2 and R3 contains at least one fluorine atom.
Dependencies are inferred from the claim text.