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US 7,067,197 B2Granted
Powder metallurgy sputtering targets and methods of producing same
AssigneeCabot Corporation
InventorsChristopher A. Michaluk, Shi Yuan, James Maguire
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Abstract
A method of forming a sputtering target and other metal articles having controlled oxygen and nitrogen content levels and the articles so formed are described. The method includes surface-nitriding a deoxidized metal powder and further includes consolidating the powder by a powder metallurgy technique. Preferred metal powders include, but are not limited to, valve metals, including tantalum, niobium, and alloys thereof.
Claims61
A sputtering target assembly comprising a consolidated surface-nitrided metal powder sputter target and a backing plate.
Dependencies are inferred from the claim text.