Manufacturing method of electron beam apparatus and spacer, and electron beam apparatus

A method of manufacturing a spacer for use in an electron beam apparatus having an airtight container with electron-emitting devices contained therein and spacers provided in the airtight container, the method comprising:

• preparing a spacer substrate having a portion, which is treated so that substantially no acute angle in a cross-section is provided at a corner portion between a first surface, which is flat, and a second surface, wherein the first surface faces a substrate of the container and the second surface is a side surface to the first surface when the spacer is arranged in the container;
• and
• applying a liquid material for a film to at least a part of the corner portion of the spacer substrate from a nozzle by a bubble generated using thermal energy, or by a piezoelectric element,
• wherein the spacer substrate is such that the following relationship is satisfied:
• (t2+4h2)<s2<(t+2h)2,
• wherein t is a maximum value of a thickness of the spacer substrate when the film is formed from the liquid material, h is a height of the film, and s is an inner peripheral length of a section of the film.