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AssigneeSued-Chemie Catalysts Japan, Inc.
InventorsSatoshi Teshigawara, Minoru Takachi, Yoshihiro Matsuda, Hidetaka Shibano, Yoshiyuki Tomiyama
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An object of the present invention is to provide a treatment agent superior in harm-removing performance to metal hydride containing exhaust gas, and its production method as well as a treatment method. It is a mixture of either copper hydroxide or basic copper carbonate and silicon compound or a mixture, wherein parts of said copper compound and said silicon compound form a complex. A preparation of the treatment agent is made by a precipitation method, wherein a copper salts solution serves as a precipitation mother solution, and a mixture solution of either alkali hydroxide or alkali carbonate and alkali silicate serves as a precipitating agent. A treatment agent obtained as its result shows a high harm-removing performance to the metal hydride gas and a low heat generation, for which reason the agent is useful for treatment of the metal hydride containing exhaust gas generated in semiconductor manufacturing.
A method of producing a treatment agent for metal hydride containing exhaust gas, wherein said agent comprises a mixture of a silicon compound with basic copper carbonate, which is produced by a neutralization reaction between a copper salts solution and an alkali-silicates-containing alkali carbonate solution or an alkali-silicates-containing alkali bicarbonates solution, or comprises such a mixture that a part of said basic copper carbonate forms a complex with a silicon compound, wherein said mixture has a Cu/Si atomic ratio ranged from 1˜10,
A method for treatment of metal hydride containing exhaust gas, said method comprising the step of:
Dependencies are inferred from the claim text.