Method and system for cleaning semiconductor elements

A system for cleaning semiconductor elements, comprising:

• a source of a mixture of ozone and oxygen;
• a CO2 source coupled to the output of the source of a mixture of ozone and oxygen to provide CO2 the mixture of ozone and oxygen and to create a CO2, ozone and oxygen mixture;
• a deionized water source;
• a contractor that receives the CO2, ozone and oxygen mixture and is coupled to the output of the deionized water source for dissolving the mixture of CO2, ozone and oxygen in the deionized water to produce ozonized deionized water;
• and
• a container that contains semiconductor elements and receives the ozonized deionized water to clean the semiconductor elements.

A system for cleaning semiconductor elements, comprising:

• a source of a mixture of ozone and oxygen;
• a means for mixing CO2 with a mixture of ozone and oxygen to create a CO2, ozone and oxygen mixture;
• a deionized water source;
• a contractor that receives the CO2, ozone and oxygen mixture and is coupled to the output of the deionized water source for dissolving the mixture of CO2, ozone and oxygen in the deionized water to produce ozonized deionized water;
• and
• a container that contains semiconductor elements and receives the ozonized deionized water to clean the semiconductor elements.