Chemical-mechanical polishing methods
AssigneeMicron Technology, Inc.
InventorMichael T. Andreas
Life of this patent
Estimating the term…
Abstract
A chemical-mechanical polishing (CMP) method includes applying a solid abrasive material to a substrate, polishing the substrate, flocculating at least a portion of the abrasive material, and removing at least a majority portion of the flocculated portion from the substrate. Applying solid abrasive material can include applying a CMP slurry or a polishing pad comprising abrasive material. Such a method can further include applying a surfactant comprising material to the substrate to assist in effectuating flocculation of the abrasive material. Such surfactant comprising material may be cationic which includes, for example, a quaternary ammonium substituted salt. Also, for example, the surfactant comprising material may be applied during polishing, brush scrubbing, pressure spraying, or buffing.
Claims20
A chemical-mechanical polishing (CMP) method comprising:
- applying a solid abrasive material to a substrate;
- flocculating at least some of the abrasive material;
- and
- removing at least some of the abrasive material.
A CMP method comprising:
- applying a solid abrasive material to a substrate;
- polishing the substrate with the abrasive material;
- after polishing, brush scrubbing the substrate using a scrubbing solution comprising a surfactant material to flocculate and remove at least a majority portion of the abrasive material.
A CMP method comprising:
- applying a solid abrasive material to a substrate;
- polishing the substrate with the abrasive material;
- after polishing, pressure spraying the substrate using a spray solution comprising a surfactant material to flocculate and remove at least a majority portion of the abrasive material.
A CMP method comprising:
- applying a solid, ceria-comprising abrasive material to a substrate;
- polishing the substrate with the abrasive material;
- applying a surfactant material comprising quaternary ammonium substituted salt to the substrate and flocculating and complexing at feast some of the abrasive material with the surfactant material;
- and
- removing at least a majority portion of the abrasive material.
Dependencies are inferred from the claim text.