Electron affinity engineered VCSELs
AssigneeFinLsar Corporation
InventorsJames R. Biard, Ralph H. Johnson, Klein L. Johnson
Life of this patent
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AssigneeFinLsar Corporation
InventorsJames R. Biard, Ralph H. Johnson, Klein L. Johnson
Estimating the term…
A VCSEL having an N-type Bragg mirror with alternating layers of high bandgap (low index) and low bandgap (high index) layers of AlGaAs. The layers may be separated by a step change of Al composition followed by a graded region, and vice versa for the next layer, in the N-type mirror to result in a lower and more linear series resistance. Also, an N-type spacer layer may be adjacent to an active region of quantum wells. There may be a similar step in a change of Al composition from the nearest layer of the N-type mirror to the N-type spacer formed from a lower bandgap direct AlGaAs layer to provide lower free carrier absorption. With electron affinity engineering, a minority carrier hole barrier may be inserted adjacent to the quantum wells to improve hole confinement at high current density and high temperature.
A VCSEL system comprising:
A VCSEL system comprising:
A VCSEL system comprising:
A VCSEL system comprising:
A VCSEL system comprising:
Dependencies are inferred from the claim text.