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US 7,064,646 B2Granted
Integrated inductor
AssigneeIntel Corporation
InventorDonald S. Gardner
Life of this patent
Estimating the term…
Abstract
An inductor comprises a substrate comprising a semiconductor material, a first dielectric layer over the substrate, a magnetic layer over the first dielectric layer, a second dielectric layer over the magnetic layer, and a conductor over the second dielectric layer.
Claims13
An inductor comprising:
- a substrate comprising a semiconductor material;
- a first dielectric layer over the substrate;
- a first magnetic layer over the first dielectric layer;
- a second dielectric layer over the first magnetic layer;
- a conductor over the second dielectric layer, wherein the conductor has an innermost turn and an outermost turn;
- and
- a second magnetic layer over the conductor, the second magnetic layer is connected to the first magnetic layer through a region within the innermost turn and a region surrounding the outermost turn of the conductor.
4 more elements
An inductor comprising:
- a substrate comprising a semiconductor material;
- a first dielectric layer over the substrate;
- a conductor having a first shape over the first dielectric layer;
- a second dielectric layer over the conductor;
- and
- a magnetic layer including at least one slot on top of the second dielectric layer, wherein the magnetic layer comprises cobalt, and wherein the at least one slot has a second shape independent on the first shape of the conductor.
3 more elements
Dependencies are inferred from the claim text.