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US 7,064,340 B1Granted
Method and apparatus for ion beam profiling
AssigneeAxcelis Technologies, Inc.
InventorsBo H. Vanderberg, Michael P. Cristoforo, Kevin W. Wenzel
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Abstract
An ion beam current density profiler includes a pair of counter-rotating cylindrical masks each featuring a helical slot. The intersection of the slots forms an aperture that scans the width of a ribbon ion beam to allow discrete portions of the beam to impact an inner, concentric current collecting cylinder.
Claims16
An ion beam dosimetry apparatus comprising:
- a conducting surface that produces a current in response to the impact of ions in the ion beam and that corresponds to a dose of ions present in the ion beam;
- a pair of overlaid concentric cylindrical masks each having at least one helical slot formed therein, wherein the slots intersect to form a movable aperture disposed between an ion beam source and the conducting surface that moves when at least one of the masks is moved relative to the other.
A method for creating an ion dosage profile of an ion beam directed along a path from an ion source to a workpiece support structure comprising:
- positioning a current collecting surface in the ion beam path;
- creating an ion beam aperture in the ion beam path by moving relative to one another two overlapping concentric cylindrical masks each having a helical slot such that an aperture is created by the intersection of the overlapping slots, wherein the aperture scans the ion beam prior to the ion beam impacting the current collecting surface;
- and
- measuring a current induced in the current collecting surface by ions impacting the surface through the aperture to determine a beam profile to calculate an ion dosage profile.
1 more element
Dependencies are inferred from the claim text.