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US 7,064,078 B2Granted
Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme
AssigneeApplied Materials, Inc.
InventorsWei Liu, Jim Zhongyi He, Sang H. Ahn, Meihua Shen, Hichem M'Saad, Wendy H. Yeh, Chistopher D. Bencher
Life of this patent
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Abstract
A method of etching a substrate is provided. The method of etching a substrate includes transferring a pattern into the substrate using a double patterned amorphous carbon layer on the substrate as a hardmask. Optionally, a non-carbon based layer is deposited on the amorphous carbon layer as a capping layer before the pattern is transferred into the substrate.
Claims23
A method of etching a substrate, comprising:
- depositing an amorphous carbon layer on the substrate;
- defining a first pattern in the amorphous carbon layer;
- depositing a layer of photoresist on the amorphous carbon layer;
- patterning the photoresist;
- transferring the pattern in the photoresist through the amorphous carbon layer to form a second pattern in the amorphous carbon layer;
- and then
- transferring the first and second patterns in the amorphous carbon layer through the substrate at the same time.
4 more elements
A method of etching a substrate, comprising:
- depositing an amorphous carbon layer on the substrate;
- depositing a non-carbon based layer on the amorphous carbon layer;
- defining a first pattern in the non-carbon based layer and in the amorphous carbon layer;
- depositing a layer of photoresist on the non-carbon based layer after the first pattern is defined in the non-carbon based layer and in the amorphous carbon layer;
- patterning the photoresist;
- transferring the pattern in the photoresist through the non-carbon based layer and the amorphous carbon layer to form a second pattern in the amorphous carbon layer;
- and
- transferring the first and second patterns in the amorphous carbon layer through the substrate at the same time.
5 more elements
A method of etching a substrate, comprising:
- depositing an amorphous carbon layer on the substrate;
- depositing a first non-carbon based layer on the amorphous carbon layer;
- defining a first pattern in the non-carbon based layer and in the amorphous carbon layer;
- depositing a second non-carbon based layer over the amorphous carbon layer after the first pattern is defined in the amorphous carbon layer;
- depositing a layer of photoresist on the second non-carbon based layer;
- patterning the photoresist;
- transferring the pattern in the photoresist through the second non-carbon based layer and the amorphous carbon layer to form a second pattern in the amorphous carbon layer;
- and
- transferring the first and second patterns in the amorphous carbon layer through the substrate at the same time.
6 more elements
Dependencies are inferred from the claim text.