Silver under-layers for electroless cobalt alloys
AssigneeApplied Materials, Inc.
InventorsSergey D. Lopatin, Arulkumar Shanmugasundrum, Yosef Shacham-Diamand
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AssigneeApplied Materials, Inc.
InventorsSergey D. Lopatin, Arulkumar Shanmugasundrum, Yosef Shacham-Diamand
Estimating the term…
In one embodiment, a method for depositing a capping layer on a substrate surface containing a copper layer is provided which includes exposing the substrate surface to a zinc solution, exposing the substrate surface to a silver solution to form a silver layer thereon and depositing the capping layer on the silver layer by an electroless deposition process. A second silver layer may be formed on the capping layer, if desired. In another embodiment, a composition of a deposition solution useful for forming a cobalt tungsten alloy contains calcium tungstate, a cobalt source at a concentration within a range from about 50 mM to about 500 mM, a complexing agent at a concentration within a range from about 100 mM to about 700 mM, and a buffering agent at a concentration within a range from about 50 mM to about 500 mM.
A method for depositing a capping layer on a substrate surface containing a copper layer, comprising:
A composition of a deposition solution for depositing a cobalt tungsten alloy comprising:
A method for depositing a capping layer on a substrate surface containing a copper layer, comprising:
A method for depositing a capping layer on a substrate surface containing a copper layer, comprising:
A method for depositing a capping layer on a substrate surface containing a copper layer, comprising:
A composition of a deposition solution for depositing a cobalt tungsten alloy comprising a calcium tungstate, a cobalt source, a complexing agent and at least one source compound selected from the group consisting of a phosphorus source, a boron source and a combination thereof.
Dependencies are inferred from the claim text.