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US 7,063,834 B2Granted
Cosmetic compositions based on multiblock ionizable polycondensates, and uses thereof
AssigneeL'oreal
InventorsNathalie Mougin, Jean Mondet
Life of this patent
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Abstract
The invention relates to novel cosmetic or dermatological compositions, characterized in that they comprise, in a cosmetically acceptable support, at least one solution or one emulsion of at least one multiblock polycondensate whose chain consists of the repetition of at least one polysiloxane block and of at least one polyurethane and/or polyurea block; the said polyurethane and/or polyurea block also including ionizable groups and the said polycondensate being dissolved in an aqueous, organic or aqueous-organic solvent system. These compositions may be used in particular in the cosmetic field of hair care, make-up or skincare.
Claims39
A composition comprising at least one solution or at least one organic solvent-in-water emulsion, wherein:
- the at least one solution or at least one organic solvent-in-water emulsion comprises at least one multiblock polycondensate dissolved in at least one solvent system chosen from an aqueous solvent system, an organic solvent system, and an aqueous-organic solvent system, wherein the organic solvent system comprises at least one organic solvent chosen from acetone, methyl ethyl ketone, methyl acetate, butyl acetate, ethyl acetate, isopropanol, ethanol, dimethoxyethane, diethoxyethane, ethylene glycol ester, propylene glycol ester, ethylene glycol ether, propylene glycol ether, ethylene glycol ester ether, and propylene glycol ester ether,
- wherein a chain of the at least one multiblock polycondensate comprises the repetition of at least one polysiloxane block and at least one second block;
- wherein the at least one second block is chosen from polyurethane and polyurea blocks;
- wherein the at least one second block comprises at least one ionizable group;
- wherein the at least one polysiloxane block is of the formula (I) below:
- wherein:
- P is a polysiloxane segment,
- X1, which may be identical or different, is chosen from —O— and
- —NH—, and
- R is a divalent radical wherein the divalent radical is chosen from
- aromatic, aliphatic and cycloaliphatic radicals;
- and
- the at least one second block is of the formula (II) below:
- wherein:
- X2, which may be identical or different, is chosen from —O— and —NH—,
- R is a divalent radical wherein the divalent radical is chosen from
- aromatic, aliphatic and cycloaliphatic radicals,
- x is an integer ranging from 1 to 10, and
- B is a radical chosen:
- from radicals of formula (IV) below:
- wherein
- R3 is chosen from linear and branched C1–C4 alkyl radicals, and
- r and s, which may be identical or different, are both integers which range from ito 10, and
- from, when B is in neutralized or quaternized form, radicals of formula (IV′) below:
- wherein
- R3 is chosen from linear and branched C1–C4 alkyl radicals, and
- R4 is chosen from hydrogen, linear and branched C1–C10 alkyl radicals, and aromatic rings, and
- r and s, which may be identical or different, are both integers which range from 1 to 10,
- and
- wherein the composition is a cosmetic or dermatological composition.
27 more elements
A composition comprising at least one solution or at least one organic solvent-in-water emulsion:
- wherein the at least one solution or at least one organic solvent-in-water emulsion comprises at least one multiblock polycondensate dissolved in at least one solvent system chosen from an aqueous solvent system, an organic solvent system, and an aqueous-organic solvent system,
- wherein a chain of the at least one multiblock polycondensate comprises the repetition of at least one polysiloxane block and at least one second block;
- wherein the at least one second block is chosen from polyurethane and polyurea blocks:
- wherein the at least one second block comprises at least one ionizable group;
- wherein the at least one polysiloxane block is of the formula (I) below:
- wherein:
- P is a polysiloxane segment.
- X1, which may be identical or different, is chosen from —O—, and —NH— and
- R is a divalent radical wherein the divalent radical is chosen from aromatic. aliphatic and cycloaliphatic radicals;
- and
- the at least one second block is of the formula (II) below:
- wherein:
- X2, which may be identical or different, is chosen from —O— and —NH—,
- R is a divalent radical wherein the divalent radical is chosen from aromatic, aliphatic and cycloaliphatic radicals,
- x is an integer ranging from 1 to 10, and
- B is a radical chosen:
- from radicals of formula (IV) below:
- wherein
- R3 is chosen from linear and branched C1–C4 alkyl radicals, and
- r and s, which may be identical or different, are both integers which range from 1 to 10, and
- from, when B is in neutralized or guaternized form, radicals of formula (IV′) below:
- wherein
- R3 is chosen from linear and branched C1–C4 alkyl radicals, and
- R4 is chosen from hydrogen, linear and branched C1–C10 alkyl radicals, and aromatic rings, and
- r and s, which may be identical or different, are both integers which range from 1 to 10,
- wherein the at least one solvent system comprises at least one global solvent for the polycondensate and at least one additional solvent which is less polar than the global solvent;
- and
- wherein the composition is a cosmetic or dermatological composition.
25 more elements
Dependencies are inferred from the claim text.