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US 7,063,603 B2Granted
Method and apparatus for cleaning a web-based chemical mechanical planarization system
AssigneeMicron Technology, Inc.
InventorsScott E. Moore, Dinesh Chopra
Life of this patent
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Abstract
A method and apparatus for cleaning a web-based chemical-mechanical planarization (CMP) system. Specifically, a fluid spray bar is coupled to a frame assembly which may be mounted on a CMP system. The fluid spray bar will move along the frame assembly. As the fluid spray bar traverses the length of the frame assembly, a cleaning fluid is sprayed onto the web in order to clean the web between planarization cycles.
Claims7
A fluid spray bar comprising:
- a first elongated member having a first fluid chamber and a second fluid chamber fluidically coupled to the first fluid chamber;
- a second elongated member having a third fluid chamber and having a plurality of nozzles fluidically coupled to the third fluid chamber, the second elongated member adapted to be coupled to the first elongated member with the third fluid chamber positionable in fluid communication with the second fluid chamber of the first elongated member;
- and
- a polishing fluid chamber, the fluid chamber having a plurality of nozzles fluidically coupled to the polishing fluid chamber, wherein the fluid spray bar is configured to dispense a first material when the fluid spray bar moves in the first direction and a second material when the fluid spray bar moves in the second direction.
1 more element
Dependencies are inferred from the claim text.