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US 7,061,587 B2Granted
Control system, lithographic apparatus, device manufacturing method, and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorJohannes Adrianus Antonius Theodorus Dams
Life of this patent
Estimating the term…
Abstract
A control system for a positioning device includes a controller connected in a feedback loop. The controller calculates a current for supply to the positioning device according to the error between a desired current value and a measured current value. This current is converted to a voltage by an amplifier and further modified by a feedforward voltage calculated using mechanical and electrical characteristics of the positioning device and a desired position and/or desired derivatives of position.
Claims19
A control system for a positioning device, comprising:
- a setpoint generator configured to calculate a desired current or voltage for supply to the positioning device according to at least one of a desired position and derivatives thereof of the positioning device;
- a controller configured to output a signal to be supplied to the positioning device according to the desired current or voltage;
- a sensor configured to measure a present value of current or voltage, wherein the controller is connected in a feedback loop such that the controller has as its input an error between the desired current or voltage and the present value of current or voltage;
- an adder configured to add a feedforward value to the signal before it is supplied to the positioning device;
- and
- a calculator configured to calculate the feedforward value using at least one of mechanical and electrical characteristics of the positioning device and at least one of the desired position and derivatives thereof of the positioning device.
3 more elements
A lithographic projection apparatus, comprising:
- a radiation system configured to provide a beam of radiation;
- a support configured to support a patterning device, the patterning device configured to pattern the beam according to a desired pattern;
- a substrate table configured to hold a substrate;
- a first positioning device configured to move the substrate table or the support;
- a projection system configured to project the patterned beam onto a target portion of substrate;
- and
- a control system configured to control the first positioning device, the control system comprising:
- a setpoint generator configured to calculate a desired current or voltage for supply to the positioning device according to a at least one of a desired position and derivatives thereof of the positioning device;
- a controller configured to output a signal to be supplied to the positioning device according to the desired current or voltage;
- a sensor configured to measure a present value of current or voltage, wherein the controller is connected in a feedback loop such that the controller has as its input an error between the desired current or voltage and the present value of current or voltage;
- an adder configured to a feedforward value to the signal before it is supplied to the positioning device;
- and
- a calculator configured to calculate the feedforward value using at least one of mechanical and electrical characteristics of the positioning device and at least one of the desired position and derivatives thereof of the positioning device.
10 more elements
A control method for a positioning device, the method comprising:
- calculating a desired current or voltage for supply to the positioning device according to at least one of a desired position and derivatives thereof of the positioning device;
- subtracting a present value of current or voltage from the desired current or voltage to calculate an error value;
- inputting the error value to a controller which outputs a signal input to the positioning device;
- calculating a feedforward value using at least one of mechanical and electrical characteristics of the positioning device and at least one of the desired position and derivatives thereof of the positioning device;
- and
- adding the feedforward value to the signal input to the positioning device.
3 more elements
A device manufacturing method, comprising:
- providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
- providing a beam of radiation;
- patterning the beam of radiation in its cross section with a patterning device;
- projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material;
- positioning the substrate or the patterning device with a positioning device;
- and
- controlling the positioning device by:
- calculating a desired current or voltage for supply to the positioning device according to at least one of a desired position and derivatives thereof of the positioning device;
- subtracting a present value of current or voltage from the desired current or voltage to calculate an error value;
- inputting the error value to a controller which outputs a signal input to the positioning device;
- calculating a feedforward value using at least one of mechanical and electrical characteristics of the positioning device and at least one of the desired position and derivatives thereof of the positioning device;
- and
- adding the feedforward value to the signal input to the positioning device.
10 more elements
Dependencies are inferred from the claim text.