Multi-charged beam lens and charged beam exposure apparatus using the same
AssigneesCanon Kabushiki Kaisha, Hitachi High-Technologies Corporation
InventorsKenichi Nagae, Haruhito Ono, Sayaka Tanimoto
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Abstract
A multi-charged beam lens formed by stacking, via insulators, at least three substrates each having a plurality of apertures which pass charged beams. The lens includes a voltage application portion arranged on at least one of the at least three substrates. The voltage application portion and the insulators are connected via an insulating portion consisting of an oxide material in order to achieve electrical isolation between the voltage application portion and the insulators.
Claims16
A multi-charged beam lens formed by stacking via insulators at least three substrates each having a plurality of apertures which pass charged beams, the lens comprising:
- a voltage application portion arranged on at least one of the at least three substrates,
- wherein said voltage application portion and the insulators are connected via an insulating portion consisting of an oxide material in order to achieve electrical isolation between said voltage application portion and the insulators.
A charged beam exposure apparatus which exposes a substrate to be exposed using a charged beam, the apparatus comprising:
- a charged beam source which emits a charged beam;
- a first electron optical system which forms a plurality of intermediate images of said charged beam source;
- a second electron optical system which projects the plurality of intermediate images formed by said first electron optical system onto a substrate to be exposed;
- and
- an alignment apparatus which holds and drives the substrate to be exposed to a predetermined position, and aligns the substrate,
- wherein said first electron optical system uses a multi-charged beam lens formed by stacking via insulators at least three substrates each having a plurality of apertures which pass charged beams, and the multi-charged beam lens has a voltage application portion arranged on at least one of the at least three substrates and the voltage application portion and the insulators are connected via an insulating portion consisting of an oxide material in order to achieve electrical isolation between the voltage application portion and the insulators.
An electrostatic lens for a charged beam, the lens comprising:
- a plurality of substrates each having at least one aperture;
- and
- spacers arranged between said plurality of substrates,
- wherein at least one of said plurality of substrates has an electrode portion which controls a trajectory of the charged beam passing through the aperture and the voltage application portion and the insulators are connected via an insulating portion consisting of an oxide material in order to achieve electrical isolation between the voltage application portion and the insulators.
A charged beam exposure apparatus, comprising:
- a charged beam source;
- and
- an electrostatic lens, the electrostatic lens having a plurality of substrates each having at least one aperture and spaces arranged between the plurality of substrates, wherein at least one of the plurality of substrates has an electrode portion for controlling a trajectory of the charged beam passing through the aperture and the voltage application portion and the insulators are connected via an insulating portion consisting of an oxide material in order to achieve electrical isolation between the voltage application portion and the insulators.
Dependencies are inferred from the claim text.