Electron beam treatment apparatus
AssigneeApplied Materials, Inc.
InventorsDavid H. Quach, Jun Zhao
Life of this patent
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Abstract
One embodiment of the present invention is an electron beam treatment apparatus that includes: (a) an array of lamps that output radiation; (b) a support mechanism adapted to support a substrate at a treatment position above the lamps; and (c) a lamp heat shield, disposed above the array, having a radiation absorption portion adapted to absorb radiation from at least a portion of the array, and a radiation reflection portion adapted to reflect radiation from at least a portion of the array towards the substrate when disposed at the treatment position.
Claims12
An electron beam treatment apparatus that includes:
- an array of lamps that output radiation;
- a support mechanism adapted to support a substrate at a treatment position above the lamps;
- and
- a lamp heat shield, disposed above the array, having a radiation absorption portion adapted to absorb radiation from at least a portion of the array, and a radiation reflection portion adapted to reflect radiation from at least a portion of the array towards the substrate when disposed at the treatment position.
A lamp heat shield useful in an electron beam treatment apparatus which comprises:
- a radiation absorption portion adapted to absorb radiation from at least a portion of an array of lamps disposed below the shield;
- and
- a radiation reflection portion adapted to reflect radiation from at least a portion of the array towards an object disposed within the radiation reflection portion.
Dependencies are inferred from the claim text.