Process control system and process control method
AssigneeTokyo Electron Limited
InventorMasayuki Tomoyasu
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AssigneeTokyo Electron Limited
InventorMasayuki Tomoyasu
Estimating the term…
A process control system that controls processing executed on semiconductor wafers by processing apparatuses 120, 122, 124 installed in each bay (area) 110 inside a factory the processing results of which are predictable, having installed in the corresponding bay, at least one measuring apparatus 130 that executes a measuring operation on workpieces undergoing the processing in the bay, a transfer path 140 of a transfer apparatus, through which the workpieces are transferred among various apparatuses installed within the bay including the individual processing apparatuses and the measuring apparatus and a process control device 150 that controls the processing apparatuses, the measuring apparatus and the transfer apparatus in the bay. This structure reduces the length of time (cycle time) to elapse from the processing through the inspection operation and also improves the operating rate of each processing apparatus.
A process control system that controls processing executed on workpieces by, at least, one processing apparatus installed in each area in a factory, the processing results of which are predictable, comprising:
A process control system that controls processing executed on workpieces by, at least, one processing apparatus installed in each area in a factory, the processing results of which are predictable, comprising:
A method of process control executed by a control device in each area in a process control system having installed in each area at least one processing apparatus, the processing results of which are predictable, at least one measuring apparatus, a transfer apparatus, and said control device that controls said processing apparatus, said measuring apparatus and said transfer apparatus, comprising the steps of:
A method of process control executed by a control device in each area in a process control system having installed in each area at least one processing apparatus, the processing results of which are predictable, at least one measuring apparatus, a transfer apparatus, and said control device that controls said processing apparatus, said measuring apparatus and said transfer apparatus, the method comprising:
A method of process control executed by a control device installed in each area in a process control system having installed in each area at least one processing apparatus, at least one measuring unit provided at said processing apparatus, at least one measuring apparatus, a transfer apparatus and said control device that controls said processing apparatus, said measuring apparatus, and said transfer apparatus, the process control method comprising:
A process control system that controls processing executed on workpieces by at least one processing apparatus installed in each area in a factory and having a processing chamber in which the processing is executed on the workpieces, a measuring unit that executes measurement processing on a workpiece before and after the processing is executed on the workpiece in said processing chamber, or either before or after the processing is executed on the workpiece in said processing chamber, and a means for in-apparatus transfer capable of transferring the workpiece at least between said processing chamber and said measuring unit, the process control system comprising:
Dependencies are inferred from the claim text.