Apparatuses and method for maskless mesoscale material deposition

An apparatus for maskless mesoscale material deposition of liquids or liquid particle suspensions in patterns on a target, said apparatus comprising:

• a first module for and providing aerosolization of a liquid selected from one or more of molecular precursors and particle suspensions and for delivering aerosolized mist to a flowhead using a carrier gas;
• a second module for focusing said liquid into an aerosol stream for depositing aerosol droplets or particles, said second module comprising a flowhead, a cylindrical chamber comprising a multi-stage virtual impactor for reducing a carrier gas flowrate, a heating assembly for evaporating solvents to modify fluid properties of an aerosol stream, and a shutter for interrupting flow of material to said target for patterning;
• a control module for automated control and monitoring of process parameters;
• a laser delivery module, comprising a processing laser, a mechanical shutter, an acousto-optic modulator, one or more delivery optics, and a focusing head;
• a motion control module, comprising a motion control card, an I/O interface, a set of X-Y linear stages, a Z-axis, and one or more amplifiers;
• and
• a computer-controlled platen;
• wherein each stage of said virtual impactor comprises a disk-shaped insert with a cylindrical chamber opened at each end, an exit orifice of said chamber tapering to a diameter that is smaller than an entrance orifice of said chamber and opening to an area enclosed by a larger cylinder;
• and
• wherein said exit orifice of a first stage and said entrance orifice of a second stage are connected to ambient conditions through a plurality of port holes in said cylinder wall.