Silicon-oxycarbide high index contrast, low-loss optical waveguides and integrated thermo-optic devices

A method for forming an optical waveguide comprising:

• forming a first cladding over a substrate;
• forming a core over the first cladding, the core comprising silicon, oxygen, and carbon, the core having a refractive index between 1.5 and 2.5, the core having a dn/dT between 1×10−5 and 3×10−5 per degree Celsius, the core being formed by a chemical vapor deposition (CVD) process using an inorganic precursor comprising silicon;
• and
• forming a second cladding over the core such that the first cladding, the core and the second cladding form an optical waveguide.

A device comprising:

• a first cladding formed over a substrate;
• a core formed over the first cladding, the core comprising silicon, oxygen, carbon, and deuterium, the core having a refractive index between 1.5 and 2.5, the core having a dn/dT between 1×10−5 and 3×10−5 per degree Celsius, the core being formed by a chemical vapor deposition (CVD) process using an inorganic precursor comprising silicon;
• and
• a second cladding formed over the core and the first cladding such that the core, the first cladding, and the second cladding form an optical waveguide.

A method for forming an optical waveguide comprising:

• forming a first cladding over a substrate;
• forming a core over the first cladding, the core comprising silicon, oxygen, carbon and deuterium, the core having a refractive index between 1.5 and 2.5, the core having a dn/dT between 1×10−5 and 3×10−5 per degree Celsius, the core being formed by a chemical vapor deposition (CVD) process using an inorganic precursor comprising silicon;
• and
• forming a second cladding over the core such that the first cladding, the core and the second cladding form an optical waveguide.