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US 7,037,639 B2Granted
Methods of manufacturing a lithography template
AssigneeMolecular Imprints, Inc.
InventorRonald D. Voisin
Life of this patent
Estimating the term…
Abstract
A method for forming imprint lithography templates is described herein. The method includes forming a masking layer and a conductive layer on a substrate surface. The use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using the patterned masking layer to produce a template.
Claims22
A method of forming a lithography template, the method comprising:
- forming a conductive polysilicon layer upon a substrate, wherein the substrate is composed of a light transmissive material;
- forming a masking layer upon the conductive polysilicon layer;
- forming a pattern in the masking layer such that a portion of the conductive polysilicon layer is exposed through the masking layer;
- etching one or more of the exposed portions of the conductive polysilicon layer such that a portion of the substrate is exposed through the conductive polysilicon layer;
- and etching one or more of the exposed portions of the substrate.
2 more elements
The method of forming alithography template, the method comprising:
- providing a substrate, the substrate comprising a base layer, an etch stop layer disposed upon the base layer, and an upper layer disposed above the etch stop layer, wherein the base layer, the etch stop layer, and the upper layer are composed of a light transmissive material;
- forming a conductive polysilicon layer upon the upper layer;
- forming a masking layer upon the conductive polysilicon layer;
- forming a pattern in the masking layer such that a portion of the conductive polysilicon layer is exposed through the masking layer;
- etching one or more of the exposed portions of the conductive polysilicon layer such that a portion of the substrate is exposed through the polysilicon layer;
- and
- etching one or more of the exposed portions of the substrate until the etch stop ayer is reached.
4 more elements
A method of patterning a lithographic template, said method comprising:
- forming, on said lithographic template, a layer of conductive polysilicon material that is transparent to visible light;
- applying, on said layer of conductive polysilicon material, a masking layer;
- creating a pattern in said masking layer to expose a sub-portion of said layer of conductive polysilicon material;
- and
- transferring said pattern into said template.
2 more elements
Dependencies are inferred from the claim text.