Method and device for passive alignment of optical waveguides and optoelectronic components and optical system using said device
AssigneeCommissariate a l'Energie Atomique
InventorsFrançois Marion, Eric Jalaguier, Jean-Charles Souriau
Life of this patent
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Abstract
Given a component comprising at least one active area formed on a substrate and designed to be coupled to a light guide, a support is used, at least one hole is formed in the support starting from one face of this support, this hole being designed to receive one end of the guide, the substrate is fixed to the other face of the support by forming the hole facing the active area if the active area has already been formed, and otherwise it is formed on the substrate facing the hole and the end of the guide is placed in the hole. The optical system is obtained by optically coupling two devices thus obtained.
Claims12
Method for passive alignment of an optoelectronic component and at least one light guide, the optoelectronic component comprising a substrate and, at least one active area on this substrate that will emit or receive this light and being optically coupled to the light guide, method in which:
- a support is used with opposite first and second faces,
- at least one hole is formed in the support, starting from the first face of this support, this hole being designed to receive one end of the light guide,
- the substrate is fixed to the second face of the support, the active area is then formed on the substrate facing the hole, and
- the end of the light guide is placed in the hole,
- this method being characterised in that first marks are also formed on the support, the substrate is fixed to the second face of this support and a photolithography technique is then used to form the active area of the optoelectronic component on this substrate, facing the hole, and photolithography is done using a mask comprising at least one pattern, this pattern corresponding to the active area to be formed, and also comprising second patterns such that when these second patterns and the first marks are aligned, the pattern of the mask is aligned with the hole of the support, and this mask is placed above the substrate by aligning the second patterns with the first marks.
A method for passive alignment of an optoelectronic component and at least one light guide, the optoelectronic component comprising a substrate and, at least one active area on this substrate that will emit or receive this light and being optically coupled to the light guide, comprising:
- a support is used with opposite first and second faces,
- at least one hole is formed in the support, starting from the first face of this support, this hole being designed to receive one end of the light guide,
- the substrate is fixed to the second face of the support, the active area is then formed on the substrate facing the hole, and
- the end of the light guide is placed in the hole,
- this method being characterised in that first marks are also formed on the support, the substrate is fixed to the second face of this support and a photolithography technique is then used to form the active area of the optoelectronic component on this substrate, facing the hole, and photolithography is done using a mask comprising at least one pattern, this pattern corresponding to the active area to be formed, and also comprising second patterns such that when these second patterns and the first marks are aligned, the pattern of the mask is aligned with the hole of the support, and this mask is placed above the substrate by aligning the second patterns with the first marks,
- and wherein the hole in the support is a non-through hole and the support is transparent to the light that will be received or emitted by the active area of the optoelectronic component.
Dependencies are inferred from the claim text.