Substrate material for X-ray optical components

A substrate material for an optical component for X-rays of wavelength 10 nm≦λR<30 nm comprising:

• a glass phase made of amorphous material having a positive coefficient of thermal expansion;
• and
• a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 38 nm,
• wherein said substrate material has a stoichiometric ratio of said crystal phase to said glass phase such that a coefficient of thermal expansion of said substrate material is less than about 5×10−6 K−1 in a temperature range of about 20° C. to 100° C., and
• wherein said substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about λR/30 rms.

An optical component for X-rays of wavelength λR, comprising:

• a substrate material that includes:
• a glass phase made of amorphous material having a positive coefficient of thermal expansion;
• and
• a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 λR,
• wherein said substrate material has a stoichiometric ratio of said crystal phase to said glass phase such that a coefficient of thermal expansion of said substrate material is less than about 5×10−6 K−1 in a temperature range of about 20° C. to 100° C., and
• wherein said substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about λR/30 rms.

An EUV projection system, comprising:

• an illumination system for illuminating a mask;
• and
• a projection lens system for projecting an image of said mask,
• wherein at least one of said illumination system or said projection lens system includes an optical component for X-rays of wavelength λR having a substrate material that includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 λR,
• wherein said substrate material has a stoichiometric ratio of said crystal phase to said glass phase such that a coefficient of thermal expansion of said substrate material is less than about 5×10−6 K−1 in a temperature range of about 20° C. to 100° C., and
• wherein said substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about λR/30 rms.

A system comprising a substrate material that includes:

• a glass phase made of amorphous material having a positive coefficient of thermal expansion;
• and
• a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 λR,
• wherein said substrate material has a stoichiometric ratio of said crystal phase to said glass phase such that a coefficient of thermal expansion of said substrate material is less than about 5×10−6 K−1 in a temperature range of about 20° C. to 100° C.,
• wherein said substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about λR/30 rms, and
• wherein said system is selected from the group consisting of an X-ray microscopy system, an X-ray astronomy system, and X-ray spectroscopy system.

A substrate material for an optical component for X-rays of wavelength 10 nm≦λR≦30 nm, comprising:

• an amorphous material having a positive coefficient of thermal expansion;
• and
• crystallites having a negative coefficient of thermal expansion and being a mean size of less than about 38 nm,
• wherein the substrate material has a coefficient of thermal expansion of less than about 5×10−6 K−1 in a temperature range of about 20° C. to 100° C., and
• wherein the substrate material has a high spatial frequency roughness (HSFR) of less than about λR/30 rms.