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US 7,031,082 B2Granted
Retainer, exposure apparatus, and device fabrication method
AssigneeCanon Kabushiki Kaisha
InventorNaoki Murasato
Life of this patent
Estimating the term…
Abstract
A retainer for holding an optical element includes a detector for detecting a deformation amount of the optical element, and an adjustment unit for adjusting the deformation of the optical element based on the deformation amount.
Claims38
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- and
- an adjustment unit for adjusting the deformation of the optical element by applying a force to the optical element in a direction opposing to a gravity direction based on the deformation amount.
A retainer for holding an optical element, said retainer comprising:
- an adjustment unit for adjusting a shape of the optical element, said adjustment unit including a component;
- and
- a detector for detecting a deformation amount of the component in said adjustment unit, said adjustment unit adjusting the shape of the optical element by applying a force to the optical element in a direction opposing to a gravity direction based on a detection result by said detector.
An adjustment method for adjusting a shape of an optical element into a desired shape, said method comprising the steps of:
- obtaining the shape of the optical element;
- calculating a force to be applied to the optical element to correct the shape of the optical element into the desired shape;
- and
- applying the force calculated by said calculating step to the optical element in a direction opposing to a gravity direction.
1 more element
An exposure apparatus comprising:
- a retainer for holding an optical element, said retainer including a detector for detecting a deformation amount in a shape of the optical element, and an adjustment unit for adjusting the shape of the optical element by applying a force to the optical element in a direction opposing to a gravity direction based on the deformation amount;
- and
- an optical system for exposing a pattern formed on a mask or reticle onto an object through the optical element held by the retainer.
An exposure apparatus comprising:
- a retainer for holding an optical element, said retainer including an adjustment unit for adjusting a shape of the optical element, said adjustment unit including a component, and
- a detector for detecting a deformation amount of the component in said adjustment unit, the adjustment unit adjusting the shape of the optical element by applying a force to the optical element in a direction opposing to a gravity direction based on a detection result by said detector;
- and
- an optical system for exposing a pattern formed on a mask or reticle onto an object through the optical element held by the retainer.
1 more element
A device fabrication method comprising the steps of:
- exposing a pattern on a mask, onto an object by using an exposure apparatus that includes a retainer that includes three support parts for supporting an optical element, a first unit for applying a first elastic force to the optical element in anti-gravity direction, and a second unit, arranged opposite to the first unit through the optical element, for applying a second elastic force to the optical element in a gravity direction, and an optical system for exposing a pattern formed on a mask or reticle onto an object through the optical element held by the retainer;
- and
- developing the object that has been exposed.
A device fabrication method comprising the steps of:
- exposing a pattern on a mask, onto an object by using an exposure apparatus that includes a retainer for holding an optical element, said retainer including an adjustment unit for adjusting a shape of the optical element, said adjustment unit including a component, and a detector for detecting a deformation amount of the component in said adjustment unit, the adjustment unit adjusting the shape of the optical element by applying a force to the optical element in a direction opposing to a gravity direction based on a detection result by said detector, and an optical system for exposing a pattern formed on a mask or reticle onto an object through the optical element held by the retainer;
- and
- developing the object that has been exposed.
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- and
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount,
- wherein said detector is a strain gauge.
1 more element
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- and
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount,
- wherein three detectors are arranged on the same circumference at a pitch of 120°.
1 more element
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount or the optical element;
- and
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount,
- wherein said adjustment unit equalizes a load applied to the optical element, and includes a coil spring.
1 more element
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- and
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount,
- wherein said adjustment unit equalizes a load applied to the optical element, and includes a coil spring and an adjustment screw for adjusting a length of the coil spring.
1 more element
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- and
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount,
- wherein three adjustment units are arranged on the same circumference at a pitch of 120°.
1 more element
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount;
- and
- a support part that supports the optical element at approximately three points.
1 more element
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- and
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount,
- wherein there are three detectors and three support parts, wherein each detector is arranged between two adjacent supports parts.
1 more element
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- and
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount,
- wherein there are three adjustment units and three support parts, wherein each detector is arranged between two adjacent supports parts.
1 more element
A retainer fur holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount;
- and
- a support part that supports the optical element at approximately three points,
- wherein said adjustment unit is provided every space between adjacent two points among the three points, and said detector is located at least one of the spaces among the three points.
2 more elements
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- and
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount,
- wherein said detector and said adjustment unit are integrated with each other.
1 more element
A retainer for holding an optical element, said retainer comprising:
- a detector for detecting a deformation amount of the optical element;
- and
- an adjustment unit for adjusting the deformation of the optical element based on the deformation amount.
- wherein the adjustment unit includes a component, and said detector detects the deformation amount by measuring a strain amount of the component in said adjustment unit.
1 more element
A retainer for holding an optical element, said retainer comprising:
- an adjustment unit for adjusting a shape of the optical element, said adjustment unit including a component;
- a detector for detecting a deformation amount of the component in said adjustment unit, said adjustment unit adjusting the shape of the optical element based on a detection result by said detector;
- and
- a Support part for supporting the optical element at approximately three points,
- wherein adjustment units are arranged at intervals of the approximately three points.
2 more elements
An adjustment method for adjusting a shape of an optical element into a desired shape, said method comprising the steps of:
- obtaining the shape of the optical element;
- calculating a force to be applied to the optical element to correct the shape of the optical element into the desired shape;
- applying the force calculated by said calculating step to the optical element;
- detecting wave front aberration of the optical element;
- and
- applying the force to the optical element so that the wave front aberration falls within a permissible range.
3 more elements
Dependencies are inferred from the claim text.